MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202647108308 A) filed by Rhodia Operations on September 09, 2026, for Cerium Oxide Particles With Controlled Microstructure.
Inventors include Suda, Eisaku; Yuasa, Manabu; and Matsumoto, Arihisa.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: The invention relates to cerium oxide particles with a controlled microstructure formed through agglomeration of primary particles, to the use of these particles in dispersions such as polishing slurries, in particular chemical mechanical polishing (CMP) compositions, and to a preparation method thereof.
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