Intellectual Property India Publishes Patent Application for Capacitor System For A Radiation Source Of A Lithographic Apparatus

MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202647092416 A) filed by Cymer, LLC on July 30, 2026, for Capacitor System For A Radiation Source Of A Lithographic Apparatus.

Inventors include Xiang, Xun; and Luo, Edward, Siqi.

The application for the patent was published on August 07, 2026, under issue no. 32/2026.

Abstract: A lithographic apparatus includes a projection system and an illumination system that includes an electrode and a set of capacitance structures. The electrode has an elongate shape. A length-wise strip of the electrode is defined from a first end of the elongate shape to a second end of the elongate shape. The length-wise strip includes electrical coupling positions includin...