MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202611116808 A) filed by Noida Institute Of Engineering And Technology Niet on September 30, 2026, for Apparatus And Method For Precision Deposition Of Polymeric Hollow Droplets With Adaptive Shell- Thickness Control.

Inventors include Prachee Srivastava; and Anurag Jha.

The application for the patent was published on October 30, 2026, under issue no. 44/2026.

Abstract: A polymeric hollow droplet precision deposition system (100) comprises a coaxial droplet generation assembly (110) with concentric outer and inner nozzles (112, 114), a shell-thickness regulation module (120) with flow rate controllers (122), a piezoelectric nozzle gap adjuster (128),...