MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202617069687 A) filed by Agfa-Gevaert Nv on June 03, 2026, for An Etch Resist Inkjet Ink.
Inventors include Cortes Salazar, Fernando; and Loccufier, Johan.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: An etch resist inkjet ink comprising: - one or more photoinitiators, wherein at least one photoinitiator is a thioxantone compound, - one or more acrylamides according to Formula (I), wherein R represents H or CH3; R1 and R2 independently from each other represent an optionally substituted alkyl group; R1 and R2 may represent the necessary atom to form a 5 or 6 membered ring; - one or more polymerizab...