MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202641076187 A) filed by Sr University on June 19, 2026, for An Ai/Ml-Based Dynamic Plant Layout Optimization System For Drone Manufacturing.
Inventors include Packiaraj C; and Dr. Damarla Ramesh Babu.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: AN AI/ML-BASED DYNAMIC PLANT LAYOUT OPTIMIZATION SYSTEM FOR DRONE MANUFACTURING This paper presents an AI/ML-based system designed to optimize drone manufacturing plant layouts through intelligent data integration, advanced modeling, and adaptive optimization. The system ingests and processes diverse operational data from ERP, MES, IoT sensors, CAD/BIM so...