MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202617062654 A) filed by Allnex Usa Inc. on May 18, 2026, for Amino Resin Composition With Reduced Formaldehyde Emission.
Inventors include Lin, Wilson, Lon-Tang; Oguma, Kei; Clarke, John Peter; and Inagaki, Katsumi.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: An alkylated amino resin composition which is the reaction product of an amino compound, formaldehyde and an alcohol, wherein the alkylated amino resin composition has a free formaldehyde content no greater than 0.15 wt.% based on the total weight of the alkylated amino resin composition, a total content of imino functional groups of at lea...