MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202611117320 A) filed by Vivekananda Institute Of Professional Studies - Technical Campus on September 30, 2026, for A System And Method For Automated Generation Of Production-Ready Two-Dimensional Garment Patterns.
Inventors include Dr. Aashita Chhabra; Shubh Gupta; and Vaanya Verma.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The invention relates to computer-implemented garment pattern engineering and discloses a dependent pipeline that converts a 2D garment sketch in JPEG or PNG format, or a 3D garment model in OBJ or FBX format, into production-ready 2D garment patterns. For a 2D route, an...