MUMBAI, India, July 30 -- Intellectual Property India has published a patent application (202621065084 A) filed by Pratiksha Dinkar Donolikar; Shivaji Babaso Sadale; and Shivaji University on May 23, 2026, for A Method For The Fabrication Of Porous Nanostructured Thin Films Of Graphitic Carbon Nitride For Photocatalytic Application.
Inventors include Shivaji Babaso Sadale; and Pratiksha Dinkar Donolikar.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: ABSTRACT Photocatalysis addresses multiple challenges regarding purification of wastewater, including disinfection of microorganisms, mineralization of pharmaceutical contaminants, breakdown of dissolved toxic compounds and degradation of pe...