MUMBAI, India, March 13 -- Intellectual Property India has published a patent application (202611009695 A) filed by Delhi Technological University, New Delhi, on Jan. 30, for 'system and method for fabricating dissimilar alloy structure using cmt-waam.'
Inventor(s) include Meena, Rajendra Prasad; Yuvaraj, Narayan; Vipin; Arora, Bharat Bhushan; and Arora, Akhilesh.
The application for the patent was published on March 13, under issue no. 11/2026.
According to the abstract released by the Intellectual Property India: "The disclosed system (100) for fabricating a dissimilar alloy structure using Cold Metal Transfer-based Wire Arc Additive Manufacturing (CMT-WAAM), includes a material deposition unit (102) configured to deposit metal layers ...