Intellectual Property India Publishes Patent Application for 'Optimization Of Nanomaterials And Fabrication Techniques Using Ai For High-Performance Wearable Antennas' Filed by U. Leelavathi; Dr. C. Bennila Thangammal; N. Mohana Priya; and R. Sandhiya

MUMBAI, India, April 17 -- Intellectual Property India has published a patent application (202641017513 A) filed by U. Leelavathi; Dr. C. Bennila Thangammal; N. Mohana Priya; and R. Sandhiya, Chennai, Tamil Nadu, on Feb. 17, for 'optimization of nanomaterials and fabrication techniques using ai for high-performance wearable antennas.'

Inventor(s) include U Leelavathi; Dr. C. Bennila Thangammal; N Mohana Priya; and R. Sandhiya.

The application for the patent was published on April 17, under issue no. 16/2026.

According to the abstract released by the Intellectual Property India: "The proposed invention presents an artificial intelligence-assisted optimization framework for the design of nanomaterial-based wearable antennas operating in th...