Intellectual Property India Publishes Patent Application for 'Method For Enhancing Wheat Growth, Yield, And Stress Tolerance Using Silicon-chitosan Biopolymeric Formulation' Filed by Lovely Professional University

MUMBAI, India, Jan. 7 -- Intellectual Property India has published a patent application (202511104220 A) filed by Lovely Professional University, Phagwara, Punjab, on Oct. 29, 2025, for 'method for enhancing wheat growth, yield, and stress tolerance using silicon-chitosan biopolymeric formulation.'

Inventor(s) include Prachi Ganesh Pangerkar; Dr. Dipti Bisarya; Reena Rathore; and Dr. Vinai Kumar.

The application for the patent was published on Dec. 12, under issue no. 50/2025.

According to the abstract released by the Intellectual Property India: "A method (100) for enhancing wheat growth, yield, and stress tolerance through a Silicon-Chitosan biopolymeric formulation. The method involves dissolving Chitosan in acetic acid, dispersing Si...