MUMBAI, India, May 1 -- Intellectual Property India has published a patent application (202641049891 A) filed by Easwari Engineering College; and Srm Institute Of Science And Technology, Ramapuram Campus, Chennai, Tamil Nadu, on April 20, for 'method for additive manufacturing of hastelloy c-22 using pulsed cold metal transfer.'
Inventor(s) include Dr. D. Sakthimurugan; Nithish Kumar M; Tejnath J M; and Sidharthan T.
The application for the patent was published on May 1, under issue no. 18/2026.
According to the abstract released by the Intellectual Property India: "The current invention presents a method to produce Hastelloy C-22 components through pulsed Cold Metal Transfer (CMT) Wire Arc Additive Manufacturing (WAAM) technology. The s...