Intellectual Property India Publishes Patent Application for 'Adsorptive Fabric Construction' Filed by Numat Technologies, Inc.; and Government Of The United States

MUMBAI, India, April 20 -- Intellectual Property India has published a patent application (202617001322 A) filed by Numat Technologies, Inc.; and Government Of The United States, Chicago, on Jan. 6, for 'adsorptive fabric construction.'

Inventor(s) include Pomerantz, Natalie L.; Richardson, Rachelle; Galphin, Benjamin; Vermeulen, Nicolaas; Argueta Fajardo, Edwin Alfonso; Morris, William; Fuller, Patrick E.; and Whitney-Warner, Javan L.

The application for the patent was published on April 17, under issue no. 16/2026.

According to the abstract released by the Intellectual Property India: "A multi-layer fabric construction for protection from airborne toxic chemical agents comprises an optional inner comfort layer, a carbon layer, an adsor...