MUMBAI, India, May 29 -- Intellectual Property India has published a patent application (202621041860 A) filed by Anup Krishnan Menon, Maharashtra, on April 1, for 'a gas-assisted stain removal process for fabrics.'
Inventor(s) include Anup Krishnan Menon.
The application for the patent was published on May 29, under issue no. 22/2026.
According to the abstract released by the Intellectual Property India: "A method for removing stains from a fabric is disclosed, wherein a cleaning composition and a gas-generating system are applied in a controlled sequence to produce in-situ gas generation within fabric fibers. The method comprises applying to a stained region a first composition including one or more cleaning agents selected from enzyme...