India, Sept. 10 -- ASML Holding N.V. and Taiwan Semiconductor Manufacturing Co. have announced a collaborative initiative to lead the semiconductor industry's transition to a larger-format Extreme Ultraviolet (EUV) lithography photomask.

While High NA EUV will be adopted for production using the current, 6-inch masks, the transition to larger, 12-inch masks is expected to further increase fab productivity, lower chipmaking costs and remove stitching constraints, benefiting the entire semiconductor industry. It will enable advanced chip manufacturers to fully leverage the advantages of High NA EUV, making future generations of leading-edge chips more cost-effective.

"We expect the adoption of High NA EUV to increase progressively along t...