Seoul, Aug. 6 -- Recent reports that China has developed its own immersion deep-ultraviolet (DUV) lithography system have jolted the global semiconductor industry, suggesting that Beijing may be closing one of the most formidable technology gaps maintained by US export controls, according to a news report by The Korea Herald.

The news report mentioned that Korean experts cautioned that building the machine is only the first step. China could still need years to prove that the equipment can operate reliably, process wafers at competitive speeds and deliver commercially viable chip yields.

Still, Beijing's steady progress toward semiconductor self-sufficiency should not be underestimated, Korea's Industry Minister Kim Jung-kwan said Thurs...