ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,926, issued on Jan. 13, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was i... Read More
ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,527,040, issued on Jan. 13, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu, Taiwan). "Semiconductor device and method for fabricating ... Read More
ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,524,197, issued on Jan. 13, was assigned to TOYOTA JIDOSHA K.K. (Toyota, Japan). "Information processing apparatus for controlling sound genera... Read More
ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,526,319, issued on Jan. 13, was assigned to Architecture Technology Corp. (Eden Prairie, Minn.). "Automated security compliance for system node... Read More
ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,527,061, issued on Jan. 13. "Thin film transistor, manufacturing method thereof, and display panel" was invented by Shuning Zhao (Shenzhen, Chi... Read More
ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,533, issued on Jan. 13, was assigned to NEC Corp. (Tokyo). "Bolometer and method for manufacturing same" was invented by Mayumi Kosaka (Tok... Read More
ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,526,108, issued on Jan. 13, was assigned to QUALCOMM Inc. (San Diego). "Dynamic measurement gap control" was invented by Jingchao Bao (San Dieg... Read More
ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,161, issued on Jan. 13, was assigned to E Ink Holdings Inc. (Hsinchu, Taiwan). "Narrow border reflective display device" was invented by Ch... Read More
ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,524,422, issued on Jan. 13, was assigned to TDAA Technologies Corp (Colorado Springs, Colo.). "Systems and methods for processing hierarchical,... Read More
ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,325, issued on Jan. 13, was assigned to TOYODA GOSEI Co. LTD. (Aichi-pref., Japan). "Complex connector and complex connector structure" was... Read More