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US Patent Issued to FEI on Sept. 29 for "Aberration correction systems and charged particle microscope systems including the same" (Dutch, American Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,644, issued on Sept. 29, was assigned to FEI Co. (Hillsboro, Ore.). "Aberration correction systems and charged particle microscope systems... और पढ़ें


US Patent Issued to ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH on Sept. 29 for "Method of characterizing a detection path of a charged particle beam and a charged particle mirror" (Dutch, German Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,645, issued on Sept. 29, was assigned to ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH (Heimstetten, Germany). ... और पढ़ें


US Patent Issued to FEI on Sept. 29 for "Multipole elements and charged particle microscope systems including the same" (Dutch, American Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,646, issued on Sept. 29, was assigned to FEI Co. (Hillsboro, Ore.). "Multipole elements and charged particle microscope systems including ... और पढ़ें


US Patent Issued to SAMSUNG ELECTRONICS on Sept. 29 for "Focused ion beam apparatus and control method thereof" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,647, issued on Sept. 29, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea). "Focused ion beam apparatus and control ... और पढ़ें


US Patent Issued to Applied Materials Israel on Sept. 29 for "Discharging a region of a sample" (Israeli Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,648, issued on Sept. 29, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel). "Discharging a region of a sample" was invented ... और पढ़ें


US Patent Issued to Applied Materials on Sept. 29 for "Shielded apparatus for ion energy analysis of plasma processes" (Irish Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,649, issued on Sept. 29, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Shielded apparatus for ion energy analysis of plas... और पढ़ें


US Patent Issued to Tokyo Electron on Sept. 29 for "Plasma processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,650, issued on Sept. 29, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus" was invented by Yohei Yamazawa (Miyagi... और पढ़ें


US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on Sept. 29 for "Semiconductor reaction chamber" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,651, issued on Sept. 29, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing). "Semiconductor reaction chamber" was... और पढ़ें


US Patent Issued to Advanced Energy Industries on Sept. 29 for "Pulse-mode control in a bias supply" (Colorado Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,652, issued on Sept. 29, was assigned to Advanced Energy Industries Inc. (Denver). "Pulse-mode control in a bias supply" was invented by F... और पढ़ें


US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on Sept. 29 for "Semiconductor processing equipment and impedance-matching method" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,654, issued on Sept. 29, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing). "Semiconductor processing equipment ... और पढ़ें