ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,649, issued on Sept. 29, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Shielded apparatus for ion energy analysis of plasma processes" was invented by David Gahan (Terenure Dublin, Ireland) and Paul Scullin (Lucan County Dublin, Ireland).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for obtaining ion energy distribution measurements in a plasma processing system comprising a substrate, a plurality of ion energy sensors each having associated control circuitry disposed in the substrate, and a conductive enclosure disposed in the substrate and surrounding each ion energy sensor and associated control circuitry such that ...