US Patent Issued to ZIRCO APPLIED MATERIALS on Sept. 29 for "Method for manufacturing low-emissivity easy-clean glass, low-emissivity easy-clean glass, and low-emissivity easy-clean composite glass" (Taiwanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,186, issued on Sept. 29, was assigned to ZIRCO APPLIED MATERIALS Co. LTD (Taoyuan City, Taiwan).

"Method for manufacturing low-emissivity easy-clean glass, low-emissivity easy-clean glass, and low-emissivity easy-clean composite glass" was invented by Shiou-Sheng Yang (Taoyuan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing low-emissivity easy-clean glass and the resulting low-emissivity easy-clean glass and low-emissivity easy-clean composite glass. The method involves using RF (Radio Frequency) sputtering of a silicon oxide target while simultaneously introducing nitrogen gas, and simultaneously using DC (Di...