US Patent Issued to Zhejiang University on Sept. 1 for "Absorption spectrum-based chemical vapor deposition online in-situ characterization system and method" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,723,976, issued on Sept. 1, was assigned to Zhejiang University (Hangzhou, China).

"Absorption spectrum-based chemical vapor deposition online in-situ characterization system and method" was invented by Rong Xiang (Hangzhou, China), Yicheng Ma (Hangzhou, China), Lingfeng Wang (Hangzhou, China), Yige Zheng (Hangzhou, China), Junhan Zhang (Hangzhou, China) and Huixu Dong (Hangzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "An absorption spectrum-based chemical vapor deposition (CVD) online in-situ characterization system includes an absorption spectrum detection device, a spectrum movement and optical path calibration device, and a tubular CVD ...