US Patent Issued to Zhejiang University on July 21 for "High-temperature resistant nano-copper produced by laser direct writing, preparation method and application thereof" (Chinese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,686,924, issued on July 21, was assigned to Zhejiang University (Hangzhou, China).

"High-temperature resistant nano-copper produced by laser direct writing, preparation method and application thereof" was invented by Kaichen Xu (Hangzhou, China), Zimo Cai (Hangzhou, China) and Huayong Yang (Hangzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a high-temperature resistant nano-copper produced by laser direct writing, a preparation method and an application thereof. The high-temperature resistant nano-copper exhibits excellent oxidation resistance, thermal stability and superior conductivity. In this disclosure, t...