US Patent Issued to ZHEJIANG OUREN NEW MATERIALS on July 21 for "Antistatic release film" (Chinese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,686,777, issued on July 21, was assigned to ZHEJIANG OUREN NEW MATERIALS Co. LTD. (Jiaxing Zhejiang, China).

"Antistatic release film" was invented by Xiaoming Yang (Jiaxing Zhejiang, China), Yaobang Li (Jiaxing Zhejiang, China), Houjun Xia (Jiaxing Zhejiang, China) and Penghui Wu (Jiaxing Zhejiang, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "An antistatic release film, comprising a substrate layer, an antistatic coating, and a release agent coating. The antistatic coating is located between the release agent coating and the substrate layer; the antistatic coating is obtained by drying a coating liquid; and the coating liquid is composed of the...