ALEXANDRIA, Va., March 24 -- United States Patent no. 12,583,043, issued on March 24, was assigned to Yield Engineering Systems Inc. (Fremont, Calif.).

"Process chamber with UV irradiance" was invented by Tapani Laaksonen (Fremont, Calif.), M Ziaul Karim (San Jose, Calif.), Christopher Lane (Los Gatos, Calif.), Craig Walter McCoy (Los Gatos, Calif.) and Ramakanth Alapati (Dublin, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor processing apparatus includes a process chamber that defines an enclosure. The enclosure includes a substrate support configured to support a substrate and rotate the substrate about a central axis of the process chamber. The substrate support is also configured t...