ALEXANDRIA, Va., July 16 -- United States Patent no. 12,668,718, issued on June 30, was assigned to YCCHEM Co. LTD. (Gyeongsangbuk-do, South Korea).

"Composition for semiconductor processing and method of fabricating semiconductor device using the same" was invented by Seung Chul Hong (Seoul, South Korea), Deok Su Han (Seoul, South Korea), Kang Sik Myung (Seoul, South Korea), Han Teo Park (Seoul, South Korea), Hyeong Ju Lee (Seoul, South Korea) and Yong Soo Choi (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "This disclosure relates to a polishing composition that includes at least one abrasive; at least one nitride removal rate reducing agent, an acid or a base; and water. The at least on...