US Patent Issued to XSYS PREPRESS on April 21 for "Method and system to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure" (Belgian, German Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,939, issued on April 21, was assigned to XSYS PREPRESS NV (Ypres, Belgium).

"Method and system to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure" was invented by Pieter Lenssens (Zottegem, Belgium), Dirk Ludo Julien De Rauw (Ninove, Belgium) and Daniel Fleischer (Rheinau, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure, in particular a desired floor thickness, includes exposing a first side of a relief precursor with electromagnetic radiation, where the exposure...