ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,407, issued on May 12, was assigned to XIAMEN SAN'AN INTEGRATED CIRCUIT Co. LTD. (Xiamen, China).
"Radio frequency device and radio frequency front-end apparatus" was invented by Yongming Zhang (Xiamen, China), Wenbi Cai (Xiamen, China), Yang Wu (Xiamen, China), Yishu Lin (Xiamen, China), Peng Wang (Xiamen, China) and Shinichiro Takatani (Xiamen, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A radio frequency device includes a substrate, an epitaxial structure, a first electrode, a second electrode, a gate structure, a metal bulk, an auxiliary metal bulk, and a metal connection line. The first/second electrode includes a first/second electrode...