ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,589, issued on June 30, was assigned to XENOMATIX NV (Leuven, Belgium).
"Method and device for determining distances to a scene" was invented by Rik Paesen (Diepenbeek, Belgium), Dirk Van Dyck (Aartselaar, Belgium), Stijn Vandewiele (Ledeberg, Belgium) and Nick Van Den Broeck (Boutersem, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method and device for determining distances to a scene determines a laser light pulse width PW that is smaller than a maximum time of flight TOFmax corresponding to a maximum distance Dmax by using a pulse width reduction factor N such that PW=(TOFmax-TDL)/N wherein TDL is a predefined delay window, determines...