US Patent Issued to WUHAN UNIVERSITY OF TECHNOLOGY on March 31 for "Impurity removal method of silicate solid waste and its application" (Chinese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,589,420, issued on March 31, was assigned to WUHAN UNIVERSITY OF TECHNOLOGY (Wuhan, China).

"Impurity removal method of silicate solid waste and its application" was invented by Tengfei Deng (Wuhan, China), Caisheng Guo (Wuhan, China) and Wei Chen (Wuhan, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses the impurity removal method of silicate solid waste and its application. This method includes: (A) Heat and melt the silicate solid waste to be treated to form the melt, and stratify the melt during the reduction reaction; (B) An upper melt component obtained by the stratification is subjected to magnetic phase-indu...