US Patent Issued to WONIK QNC on Sept. 1 for "Method and apparatus for dry-cleaning AlN heater for semiconductor fabrication equipment" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,420, issued on Sept. 1, was assigned to WONIK QNC Corp. (Gumi-si, South Korea).

"Method and apparatus for dry-cleaning AlN heater for semiconductor fabrication equipment" was invented by Eun Young Choi (Hwaseong-si, South Korea), Sang Hyun Cho (Suwon-si, South Korea), Seung Jin Jung (Seoul, South Korea), Joo Hee Jang (Hwaseong-si, South Korea), So Young Choi (Anseong-si, South Korea), Dong Ho Shin (Seoul, South Korea), Jong Hwan Mun (Anseong-si, South Korea) and Min Seob Jung (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method and an apparatus for dry-cleaning an aluminum nitride (AlN) heater for semiconductor fab...