ALEXANDRIA, Va., March 17 -- United States Patent no. 12,581,910, issued on March 17, was assigned to WONIK IPS Co. LTD. (Pyeongtaek-si, South Korea).
"Substrate processing apparatus" was invented by Kwang Ha Choi (Sejong-si, South Korea), Tae Ho Ham (Hwaseong-si, South Korea) and Cheol Woo Lee (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus, and more particularly, to a substrate processing apparatus that performs substrate processing on a plurality of substrates in a process chamber defining a plurality of processing spaces. The substrate processing apparatus includes a process chamber in which N processing spaces are defined to process s...