ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,495,621, issued on Dec. 9, was assigned to WAYS TECHNICAL CORP. LTD. (Taoyuan, Taiwan).

"Thin film photovoltaic structure and manufacturing method thereof" was invented by Chung-Wen Ko (Taoyuan, Taiwan), Yu-Fan Chang (Taoyuan, Taiwan), Yu-Yang Chang (Taoyuan, Taiwan), Sung-Chien Huang (Taoyuan, Taiwan) and Hsiou-Ming Liu (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A thin film photovoltaic structure has a substrate, a first conductive layer, a photovoltaic layer, a second conductive layer, multiple serial connection conductive layers and multiple first insulating areas. By using the serial connection conductive layer, each width betwee...