US Patent Issued to Washington University on June 3 for "High-Q whispering gallery mode (WGM) resonators encapsulated in polydimethylsilozane (PDMS) for highly sensitive displacement detection" (Missouri Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,320,682, issued on June 3, was assigned to Washington University (St. Louis).

"High-Q whispering gallery mode (WGM) resonators encapsulated in polydimethylsilozane (PDMS) for highly sensitive displacement detection" was invented by Jie Liao (St. Louis), Lan Yang (St. Louis), Abraham Qavi (St. Louis) and Maxwell Adolphson (St. Louis).

According to the abstract* released by the U.S. Patent & Trademark Office: "A displacement sensor including an optical whispering gallery mode (WGM) microresonator and a package encasing at least a portion of the WGM microresonator, the package comprising polydimethylsiloxane (PDMS). The WGM microresonator can be configured as a sensor and used in a displ...