ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,384, issued on Dec. 2, was assigned to VISERA TECHNOLOGIES COMPANY Ltd. (Hsin-Chu, Taiwan).
"Method forming grating device" was invented by Chun-Wei Huang (Hsin-Chu, Taiwan), Yu-Shan Tsai (Hsin-Chu, Taiwan) and Po-Han Fu (Hsin-Chu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method forming a grating device includes: providing a substrate; entering the substrate into a process chamber; and depositing a grating material on the substrate to form a grating material layer on the substrate. A refractive index of the grating material gradually changes during depositing the grating material in the process chamber. The grating material layer inclu...