ALEXANDRIA, Va., March 24 -- United States Patent no. 12,584,212, issued on March 24, was assigned to Versum Materials US LLC (Tempe, Ariz.).

"Compositions and methods using same for germanium seed layer" was invented by Matthew R. Macdonald (Mission Viejo, Calif.) and Manchao Xiao (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "Precursors and methods for (a) forming silicon-containing films and (b) functionalizing substrate surfaces in order to generate a germanium seed layer suitable for deposition of Ge films. In one aspect, there is provided a precursor of Formula I and/or a precursor of Formula II:as described herein."

The patent was filed on July 23, 2021, under Application No. 18/006,856. ...