ALEXANDRIA, Va., June 16 -- United States Patent no. 12,655,524, issued on June 16, was assigned to Versum Materials US LLC (Tempe, Ariz.).

"Monoalkoxysilanes and dialkoxysilanes and dense organosilica films made therefrom" was invented by Manchao Xiao (San Diego), William Robert Entley (Gilbert, Ariz.), Daniel P. Spence (Carlsbad, Calif.), Raymond Nicholas Vrtis (Carlsbad, Calif.), Jennifer Lynn Anne Achtyl (Chandler, Ariz.), Robert Gordon Ridgeway (Chandler, Ariz.) and Xinjian Lei (Vista, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for making a dense organosilicon film with improved mechanical properties, the method comprising the steps of: providing a substrate within a reaction chamber...