US Patent Issued to Venture Digital on Oct. 6 for "Mask" (Chinese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. D1,152,221, issued on Oct. 6, was assigned to Venture Digital LLC (Evansville, Ind.).

"Mask" was invented by Chen Siwei (Jingzhou, China), Chen Simin (Jingzhou, China) and Chen Shaonan (Jingzhou, China).

The patent was filed on Oct. 22, 2025, under Application No. D/029,206.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1152221&OS=D1152221&RS=D1152221

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