ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,711, issued on Oct. 27, was assigned to VALQUA LTD. (Tokyo).
"Liquid pressure apparatus monitoring system" was invented by Akira Ueda (Gojo, Japan) and Akihiro Nagano (Gojo, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A liquid pressure apparatus monitoring system includes a liquid pressure apparatus, a liquid pressure sensor, a display device, a returning device, and a control device, in which the control device is configured to determine, in a first step, the state of the liquid pressure apparatus from states of normal operation, maintenance, and stop of use on the basis of a signal acquired from the liquid pressure sensor, and display, in...