ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,544,808, issued on Feb. 10, was assigned to Ushio Denki K.K. (Tokyo).
"Reduction treatment method" was invented by Akihiro Shimamoto (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a reduction treatment method in which hydrogen radicals are efficiently generated in an amount required for reduction treatment and the surface of an object to be treated is reduced by a relatively simple treatment process. A reduction treatment method including: irradiating a hydrogen radical source-containing material with ultraviolet light having a wavelength of 255 nm or less to generate hydrogen radicals; and bringing the generated hydrogen radicals int...