ALEXANDRIA, Va., May 12 -- United States Patent no. 12,623,901, issued on May 12, was assigned to University of Florida Research Foundation INC. (Gainesville, Fla.).

"Hierarchical silicon nanostructures, methods of making, and methods of use" was invented by Peng Jiang (Gainesville, Fla.), Zhuxiao Gu (Gainesville, Fla.) and Calen Leverant (Gainesville, Fla.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein are antireflective materials and methods of making antireflective materials. The material can include a plurality of hierarchical nanostructures on abase substrate and a total specular reflection of less than 3% at a wavelength of about 400 nm to about 1100 nm. The material can have an etched...