US Patent Issued to United Microelectronics on July 28 for "Method of shuttle mask" (Taiwanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,694,189, issued on July 28, was assigned to United Microelectronics Corp. (Hsinchu, Taiwan).

"Method of shuttle mask" was invented by Chia-Chen Sun (Kaohsiung City, Taiwan) and En-Chiuan Liou (Tainan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A design method of a shuttle mask including the following steps is provided. A first integrated circuit (IC) design is provided in a first chip region, and a second IC design is provided in a second chip region. The first IC design includes first main patterns. The second IC design includes second main patterns. First dummy insertion patterns are added in the first chip region, and second dummy ins...