ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,977, issued on April 14, was assigned to UNITED MICROELECTRONICS CORP. (Hsinchu, Taiwan).
"Optimization method for mask pattern optical transfer" was invented by Chun-Yi Chang (Taichung City, Taiwan) and Wen-Liang Huang (Hsinchu City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optimization method for a mask pattern optical transfer includes steps as follows: First, a projection optical simulation is performed to obtain an optimal pupil configuration scheme corresponding to a virtual mask pattern. Next, a position scanning is performed to change the optimal pupil configuration scheme, so as to generate a plurality of adjusted pupil con...