US Patent Issued to UCHICAGO ARGONNE on Oct. 6 for "Techniques for improved critical dimension metrology" (Illinois Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,013, issued on Oct. 6, was assigned to UCHICAGO ARGONNE LLC (Chicago).

"Techniques for improved critical dimension metrology" was invented by Miaoqi Chu (Naperville, Ill.), Jin Wang (Hinsdale, Ill.) and Zhang Jiang (Naperville, Ill.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques for improving critical dimension metrology are disclosed herein. An example method includes emitting a radiation beam comprising (i) a primary beam that passes through a sample and scatters into a set of scattered beams and (ii) a reference beam. The method further includes detecting the reference beam and a portion of the set of scattered beams, wherein the refere...