US Patent Issued to Transcene on Dec. 23 for "Semiconductor chemical mechanical polishing sludge recycling device" (Taiwanese Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,503,383, issued on Dec. 23, was assigned to Transcene Corp. (Tainan, Taiwan).

"Semiconductor chemical mechanical polishing sludge recycling device" was invented by Ya-Min Hsieh (Tainan, Taiwan), Hsin-Hui Chou (Tainan, Taiwan), Hsing-Wen Hsieh (Tainan, Taiwan), Shao-Hua Hu (Tainan, Taiwan), Wen-Ming Cheng (Tainan, Taiwan) and Chin-An Kuan (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a semiconductor chemical mechanical polishing sludge recycling device, which includes a roasting device, a soaking and stirring device, a first centrifugal dehydration device, a cleaning device and a second centrifugal dehydr...