ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,793, issued on June 3, was assigned to TOYOTA JIDOSHA K.K. (Toyota, Japan).
"Apparatus for producing guest-free silicon clathrate" was invented by Nobuhira Abe (Toyota, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "[Problem] To improve productivity of guest-free silicon clathrates[Solution] A method of producing a guest-free silicon clathrate includes a synthesizing step of performing a heat treatment on a mixture containing Si as a material serving as a host and a material serving as a guest to synthesize a silicon clathrate compound; and a guest removing step of irradiating the silicon clathrate compound contained in a container with an elec...