US Patent Issued to Tosoh SMD on Feb. 10 for "Tantalum sputtering target with improved performance and predictability and method of manufacturing" (Ohio Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,545,993, issued on Feb. 10, was assigned to Tosoh SMD Inc. (Grove City, Ohio).

"Tantalum sputtering target with improved performance and predictability and method of manufacturing" was invented by Weifang Miao (Columbus, Ohio), Eduardo del Rio Perez (Dublin, Ohio), Alex Kuhn (Columbus, Ohio), Michael McCarthy (Grove City, Ohio), John Rizer (Grove City, Ohio) and Erich Theado (Columbus, Ohio).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for making tantalum sputtering targets with stable through thickness {100}+{111} preferred crystallographic orientation volume fraction is disclosed. Starting from electron beam melted tantalum ingots, the metho...