ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,430, issued on June 23, was assigned to TOSOH Corp. (Shunan, Japan).

"Cr-Si-C-based sintered body" was invented by Hiroyuki Hara (Ayase, Japan), Masami Mesuda (Ayase, Japan) and Ayaka Masuda (Ayase, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the present invention is to provide a high-density Cr-Si-C-based sintered body including chromium (Cr), silicon (Si) and carbon (C) and is furthermore to provide at least one of the high-density Cr-Si-C-based sintered body, a sputtering target including the sintered body or a method for producing a film using the sputtering target. The present invention can provide a Cr-Si-C-based sintered...