ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,358, issued on March 17, was assigned to TOPPAN PRINTING Co. Ltd. (Tokyo).

"Gas barrier film and method of producing the same" was invented by Yusuke Kuwagata (Tokyo), Yasunori Kurauchi (Tokyo), Toshiaki Yoshihara (Tokyo) and Takafumi Horiike (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas barrier film including: a plastic substrate; an atomic layer deposition film disposed on the plastic substrate; and an overcoat layer disposed on the atomic layer deposition film. The overcoat layer contains a thermoplastic resin, and has a glass transition temperature in a range of 20deg C. or more and 100deg C. or less."

The patent was filed on Jul...