US Patent Issued to TOPPAN on May 19 for "Manufacturing method of filter for solid-state imaging element and manufacturing method of solid-state imaging element" (Japanese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,270, issued on May 19, was assigned to TOPPAN Inc. (Tokyo).

"Manufacturing method of filter for solid-state imaging element and manufacturing method of solid-state imaging element" was invented by Yasutake Akeno (Taito-ku, Japan), Reiko Iwata (Taito-ku, Japan) and Yuri Nagai (Taito-ku, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a filter for a solid-state imaging element, including forming a color filter on a semiconductor substrate, forming an etching stopper layer on the semiconductor substrate and the color filter, forming an infrared cut precursor layer on the etching stopper layer, forming a resist pattern that...