US Patent Issued to TOPPAN on Feb. 17 for "Pellicle film, pellicle, carbon nanotube web and production method therefor, carbon nanotube film, and carbon nanotube thread and production method therefor" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,192, issued on Feb. 17, was assigned to TOPPAN INC. (Tokyo).

"Pellicle film, pellicle, carbon nanotube web and production method therefor, carbon nanotube film, and carbon nanotube thread and production method therefor" was invented by Naoya Takada (Tokyo), Kazunori Seki (Tokyo) and Yutaka Kodera (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A technique that can achieve a pellicle film made of carbon nanotubes and having high in-plane transmittance uniformity. The pellicle film contains a plurality of first carbon nanotubes extending in a first direction and arrayed in the radial direction, and a plurality of second carbon nanotubes extendin...